Optical Process Monitor Optius

s-Optius

Enable to monitor the situation of various processes in real time by measuring an emission spectrum of the plasma. Optimum for feedback control of the MFC by the reactive sputtering process and endpoint detection of the etching process.

Features

  • Broad measurement wavelength
    Measurement wavelength range is 200 to 1000nm, it is also possible to measure simultaneously specified multiple wavelengths
  • Simultaneous measurement of up to 5ch
    Addition of the Expansion unit (ESC) options enable simultaneous measurement of up to 5ch
  • Feedback control
    Feedback control of external equipment by measurement result.
  • Exclusive software 
    Exclusive software corresponding to multiple processes including the reactive sputtering and etching is included.
  • Two kinds of light receiving units
    Receiver unit can be selected from atmosphere type or vacuum type depending on the application.

Applications

  • Feedback control of MFC and process monitoring in reactive sputtering
  • Endpoint detection by the plasma etching process
  • Confirmation of the cleaning and initialization status of Etching and CVD equipments

Specifications

ModelOptius
Number of measurement channel1ch : Main unit (TSC)
Maximum 5ch : Add an expansion unit options (ESC)
Wavelength range200 to 1000nm
Optical resolution *11.7nm (FWHM)
Integration time1 to 1000ms
PID control cycle time100 to 1000ms
Number of measurement wave length *210
Number of wavelengths that PID control is possible *21
Number of wavelength operation processing *210
Number of discriminant processing *210
Analog inputChannel3ch (Per measurement ch), Max 15ch (At 5ch measurement)
SignalMassflow Rate, Power surplly voltage, Pressure level
Voltage0 to +5V or 0 to +10V
Analog outputChannel4ch (Per measurement ch), Max 20ch (At 5ch measurement)
SignalMassflow control, Wave length strength, Calculation result
Voltage0 to +5V or 0 to +10V
Disital inputChannel4ch (Per measurement ch), Max 20ch (At 5ch measurement)
SignalSTART, STOP, ABORT
Disital outputChannel4ch (Per measurement ch), Max 20ch (At 5ch measurement)
SignalValve close, Set point, Pressure alarm, Error
Connection with PC *3LAN (1000BASE-T/100BASE-TX)
Dimensions (W×D×H)Main unit (TSC) : 250×300×121mm
Expansion unit (ESC) : 50×300×121mm
WeightMain unit (TSC) : 4.9kg
Expansion unit (ESC) : 1.3kg
PowerAC100 to 240V (50/60Hz)
Consumed power60W (5ch)
Operating environmentTemperature : 10 to 40ºC
Humidity : 15 to 80% RH (Non condensing)
*1This value is a reference.
*2Number of the simultaneous measurement processing per measurement ch
*3PC is not included. For the specifications of PC, please refer to the standard specifications.

 

FEATURES
Optical Process Monitor  Optius